Contrast in scanning probe microscopy images of ultra-thin insulator films

نویسندگان

  • Andreas Klust
  • Taisuke Ohta
  • Markus Bierkandt
  • Carsten Deiter
  • Qiuming Yu
  • Joachim Wollschläger
  • Fumio S. Ohuchi
  • Marjorie A. Olmstead
چکیده

The contrast in scanning probe microscopy (SPM) images of ultra-thin CaF2 films epitaxially grown on Si(111) is studied using scanning tunneling microscopy (STM) and scanning force microscopy (SFM). STM images of CaF2/Si(111) exhibit a distinct contrast depending on the bias voltage. While images obtained with positive sample bias voltages show the physical topography of the film, images obtained with negative voltages either do not show CaF2 islands or image them as depressions (contrast inversion) at high negative bias voltages (exceeding -8 V). Using SFM, CaF2 can be distinguished from the underlying Si-CaF interface layer by measuring the dissipation of the cantilever oscillation caused by the contact potential difference between CaF2 and the CaF bilayer.

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تاریخ انتشار 2005